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» Project Cost |
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Project
Cost: |
58,300,000 |
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Construction Cost
(excludes hookup): |
$47,420,000 |
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» Capabilities and
Processes: |
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Cleanroom:
Wet Etch
Dry Etch
Chem/Bio
Implant
Metal Deposition
RIE
Lithography |
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Laboratories |
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CVD
MBE
Nanotechnology Incubator
Instructional Lab
Molecular Electronics
Bio-MEMS(Microelectro-mechanical
Systems)
Instrument lab Analytical Bio-Chem |
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Characterization Materials
Chem/Bio
Nano-Mechanical MEMS
Electron Micoroscopy
Electrical Characterization
RF/Microwave Characterization
Optical and surface Analysis Lab
Nanostructures |
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» Environmental
Criteria: |
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Temperature:
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Cleanrooms,
Epigrowth Labs |
68°F ± 2°F,
45%RH ± 5% |
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General
Laboratories |
70°F ± 2°F,
30-50%RH (Seasonal) |
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Metrology/Nanostructure Characterization |
70°F ±
0.5°F, 30-50%RH (Seasonal) |
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Nanostructure Instrument Development |
70°F ±
0.25°F(± 0.1°C), 30-50%RH (Seasonal) |
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Office |
70°F -74°F,
30-50%RH (Seasonal) |
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Vibration |
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General
laboratory |
2000 - 4000
µinch/s |
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Class 1000 Cleanroom |
1000
µinch/s (VC-B) |
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Class 100
Cleanroom |
250 µinch/s
(VC-D) |
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Class 10
Cleanroom |
125 µinch/s
(VC-E) |
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Metrology/Nanostructure (Surface) Characterization |
125 - 250
µinch/s (FC-D to VC-E) |
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Nanostructure AFM/Atom Pushing |
125 µinch/s
(VC-E or NIST-A) |
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Nanostructure Instrument Development |
>50 µinch/s capable (NIST-A1)
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Noise |
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General Lab |
NC 35 ~ NC
45 |
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Cleanroom |
NC55 ~ NC
65 |
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Metrology; Surface
Characterization |
NC 30 |
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Nanostructures AFM |
NC 30 |
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Nanostructures
Instrument Development |
NC30 |
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Cleanroom
Classification |
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Cleanroom |
Class 10: Lithography
Class 100: Cleans & diffusion, Oxidation
Class 1000:
Chem/Bio Bay
Clean Deposition
Dry Etch
Exhot Metal Deposition
Implant
Quarts Clean
RTP & Anneal
Wet Etch & CMP |
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Instrument Development Laboratories |
Temperature
< 0.25°F(± 0.1°C)
Vibration < 50 µinch/s |
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Electro
Magnetic Interference |
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General
laboratories/Electrical Characterization |
1-3 milligause |
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Nanostructure Characterization & Instrument
Development |
0.1
milligause |
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